Gas Analysis
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Advanced process expert for Multi-Pressure ALD/CVD and Etch.
- xParts coated for extended lifetime in harsh chemistry
- Multi pressure sampling inlet
- Detection limit below 10 ppb
- Industry leading pumping speed
Advanced process expert for Single Pressure ALD/CVD and Etch.
- xParts coated for extended lifetime in harsh chemistry
- High temperature single pressure inlet
- Detection limit below 10 ppb
- Industry leading pumping speed
Extreme PVD Process Monitoring Quadrupole Mass Spectrometer
- Industry leading maximum operating pressure
- Optional overpressure isolation valve interlock
- Scans up to 100 amu
High performance quadrupole mass spectrometer
- Nine-decade dynamic range
- Industry leading data collection rate
- Interchangeable sensors and electronics
- Scans up to 300 amu
Multi-Purpose Quadrupole Mass Spectrometer
- Nine-decade dynamic range
- Interchangeable sensors and electronics
- Optional continuous dynode electron multiplier
- Scans up to 200 amu
Versatile process monitoring from baseline to process pressure
- Ideal semiconductor process monitor
- Multi pressure sampling inlet
- Detection limit below 1 ppm
- Integrated differential pumping
Process monitoring at target pressure range
- Targeted high pressure processes
- Single pressure sampling inlet
- Detection limit below 1 ppm
- Integrated differential pumping system
QMG 700 Analytical Mass Spectrometer to break through detection barriers and propel your process to the next level of innovation
- Mass range options from 1-512 amu
- More than nine decades of dynamic range
- Extremely fast measurement speeds: 0.125 ms/amu
- MDPP < 10E-16 mbar
High speed chamber leak test - gas analysis
- High speed leak detection allows chamber leak test
- Smart algorithm for easy integration
- Long life time, no filament burns, air inrush protection
- Withstand process chemistry
Provide real-time leak detection, endpoint detection and process monitoring for cutting-edge semiconductor manufacturing processes and other gas analysis applications
- Operating range from 1 Torr up to 450 Torr
- Superior detection limit < 1 ppm
- Long-term reliability: no pumps required
- Easy installation using a standard KF25 connection
Provide real-time leak detection and endpoint detection for critical process environments
- Operating range of 10 mTorr to 1 Torr
- Excellent detection limits down to low ppm levels
- Long-term reliability: no pumps required
- Easy installation using a standard KF25 connection
Optimize your combustion efficiency
- Displays efficiency, O2, CO2, CO and flue gas temperature readings all on one screen
- Easy-to-read backlit display
- Monitor system pressures with built-in manometer and hose kit
- QR code for quick analysis reports using the FLUE-Mate mobile app
Simplify and Accelerate Gas Analysis
- Minimize analysis time
- Maximize availability
- License free access
- Easy connectivity
High pressure samples, especially those containing contaminants, such as condensing aerosols, can be harmful to Micro GC Fusion. The External Sample Conditioner, or ESC, provides both a pressure reducing feature while maintaining the sample temperature at >50°C (122°F).
- Easily attaches to Micro GC Fusion
- Side door for easy filter replacement
- Use a quick connect fitting for easy sampling
- Can be taken into the field for on-site sampling
Web-based user interface that provides several novel benefits over traditional software.
- Operating system independent
- License-free
- Built with every instrument
- No installation required
Allows the Transpector CPM to become a mobile troubleshooting instrument
- Flexible enough to get a Transpector CPM where you need it
- A small footprint to fit in those tight spaces
- A complete system able to hold everything needed to run the Transpector CPM