RF Sensing Technology

With our advanced RF sensing technology, we deliver non-invasive solutions for high-speed data collection, arc detection, and process control in industrial settings. Our sensors are designed to enhance efficiency and reduce operational costs by integrating real-time monitoring and precise endpoint control. 

Plasma Monitoring Accuracy with INFICON's RF Technology

Achieving precise process control in semiconductor manufacturing requires the right tools. INFICON's RF sensing technology provides powerful solutions. With the Sion™, we have developed a product for real-time monitoring of wafer etching and plasma monitoring processes. Using RF technology, our sensor provides continuous feedback to ensure accurate endpoint detection, helping to avoid over-etching and material waste.

Whether dealing with delicate plasma conditions or ensuring consistent etch quality, INFICON's RF sensor technology minimizes downtime and maximizes efficiency. Its rugged design withstands harsh environments while maintaining peak performance, making it an essential tool for high-stakes production.

When integrated into your process, INFICON's RF sensing tools improve workflow reliability, streamline operations, and ensure minimal downtime. With these advanced solutions, you can achieve faster, more accurate manufacturing results that increase your competitive advantage.